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Thin Film Formation Equipment - メーカー・企業6社の製品一覧とランキング

更新日： 集計期間:Sep 17, 2025～Oct 14, 2025
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Thin Film Formation Equipmentのメーカー・企業ランキング

更新日： 集計期間:Sep 17, 2025～Oct 14, 2025
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  1. 神港精機 東京支店 Tokyo//Industrial Machinery
  2. シンクロン Kanagawa//Industrial Machinery
  3. SPD研究所 Shizuoka//Industrial Electrical Equipment
  4. 4 魁半導体 Kyoto//Educational and Research Institutions
  5. 5 昭和真空 Kanagawa//Industrial Machinery
企業ランキングへ

Thin Film Formation Equipmentの製品ランキング

更新日： 集計期間:Sep 17, 2025～Oct 14, 2025
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  1. Conductive carbon thin film formation device (arc discharge sputtering device) 神港精機 東京支店
  2. New High-Speed IAD Vacuum Thin Film Formation Device BIS-1300 シンクロン
  3. SPD Research Institute, Inc. - Business Introduction SPD研究所
  4. 4 "Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]” 魁半導体
  5. 4 SPD Film Formation Device KM-300 SPD研究所

Thin Film Formation Equipmentの製品一覧

1～9 件を表示 ／ 全 9 件

表示件数
Conductive carbon thin film formation device (arc discharge sputtering device)

Conductive carbon thin film formation device (arc discharge sputtering device)

Conductive carbon thin films are formed by sputtering. Stable film formation is achieved through a simple process with inert gas and carbon target at low temperatures (below 400°C).

Using the independent high-density sputtering method, conductive carbon thin films are formed through a process equivalent to metal film deposition via arc discharge magnetron sputtering (ADMS method). Compared to conventional sputtered carbon thin films, these films are characterized by significantly higher density and adhesion. Due to their conductive properties and film stability, they are suitable for new fields such as energy and biosensors. Conductive carbon thin films excel in hardness and surface smoothness, making them applicable for surface treatment of mechanical parts (tribological applications) due to their high adhesion to metals.

  • Sputtering Equipment
  • Plasma surface treatment equipment
  • Other processing machines

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New High-Speed IAD Vacuum Thin Film Formation Device BIS-1300

New High-Speed IAD Vacuum Thin Film Formation Device BIS-1300

Vacuum film formation device. Ion-assisted deposition device with a new concept.

【Features】 ● Reduction of operator workload through a new control system ● Shortened production time due to improved exhaust and film formation speed ● Improved film reproducibility with a new optical film thickness gauge and a new monitor glass mechanism ● Achieved a compact layout

  • Other processing machines

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"Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]”

"Glass coating 'thin film formation technology' at room temperature and atmospheric pressure [*Technical materials available!]”

Thin film formation at room temperature and atmospheric pressure! Using inexpensive film materials! Immediate delivery campaign ongoing.

Glass thin films are formed in a room temperature and atmospheric pressure environment. Due to its high reflowability, it is suitable for forming thin films on uneven surfaces. There is minimal loss of film materials, and it can be formed with inexpensive materials, allowing for cost reduction! It is ideal for forming protective films on glass alternative polycarbonate, screen protectors for mobile phones, and hydrophilic coatings. *Currently, we are holding an "Immediate Delivery Campaign"! We offer our equipment, including thin film formation devices, with astonishingly short delivery times. For more details, please download the catalog. **Features** - Thin film formation at room temperature and atmospheric pressure! - High reflowability makes it suitable for forming thin films on uneven surfaces! - Minimal loss of film materials! Can be formed with inexpensive materials! **Examples of Applications** - Formation of protective films on glass alternative polycarbonate! - Screen protectors for mobile phones! - Hydrophilic coatings! - Pre-treatment coatings for painting, printing, and coating! *For details on thin film formation technology or the immediate delivery campaign, please contact us or download the catalog from the link below.*

  • Other processing machines
  • Coater
  • others

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SPD Film Formation Device KM-300

SPD Film Formation Device KM-300

Removable and capable of automatic operation, a powerful exhaust and powder separation system!

The SPD film formation device KM-300 is compatible with 300mm square substrates and uses three spray nozzles with a special scanning pattern to achieve uniform film formation in a short time. It features powerful downward exhaust and a powder separation system, allowing for easy removal and cleaning, or automatic operation. For more details, please contact us or download the catalog.

  • Separation device

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SPD Research Institute, Inc. - Business Introduction

SPD Research Institute, Inc. - Business Introduction

We will challenge ourselves to create innovative and high-value-added products that meet your needs!

SPD Research Institute, Inc. is a company engaged in the manufacturing and sales of SPD thin film formation equipment, as well as the development of next-generation thin film solar cells. Our company aims to provide energy supply using various thin films produced by chemical thin film formation technology, along with the production of devices related to this technology, and to develop new dye-sensitized solar cell systems that contribute to environmental conservation. In the fields of energy and the environment, we challenge ourselves to create innovative and high-value-added products that meet customer needs, contributing to society together with our clients. [Business Introduction] ■ Manufacturing and sales of SPD thin film formation equipment, DSC and PSC prototype equipment, FTO transparent conductive films, etc. ■ Development of next-generation thin film solar cells ■ Contract research and development of prototypes related to thin film application devices ■ Development of DSC continuous production systems For more details, please refer to our catalog or feel free to contact us.

  • Power Monitoring Equipment

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Vacuum film formation device

Vacuum film formation device

I will give you a booklet summarizing vacuum film formation and equipment.

This document is aimed at those who use vacuum thin film formation equipment to create thin films, covering the following basic topics: - What is vacuum? - What thin film formation technologies utilize vacuum? - What is a thin film? - What types of equipment are used for thin film formation? - What should be noted when using vacuum equipment? - Daily maintenance, etc. It contains fundamental information necessary for vacuum thin film formation. We hope that by reading this document, you can make the most of the performance of vacuum thin film formation equipment. ~For those who wish to receive the document, please request it from "Request for Materials"~ *For information on Synchron's lineup of vacuum thin film formation equipment, please check "Download."

  • Vacuum Equipment

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Atmospheric Pressure Thin Film Formation Device TEOS+O3-100

Atmospheric Pressure Thin Film Formation Device TEOS+O3-100

Forming glass thin films in room temperature and atmospheric pressure environments!

The formation of glass thin films has become possible in room temperature and atmospheric pressure environments. It can be processed for a wide range of objects, from mobile phone protective films to glass. Efficient painting is also possible with a small amount of paint!

  • Other processing machines

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Optical Thin Film Formation Device Genesis-AR Series

Optical Thin Film Formation Device Genesis-AR Series

Ideal for film formation on high curvature lenses and ball lenses, which is difficult with sputtering.

In the optical thin film process, by using the ALD (Atomic Layer Deposition) method, which is different from the commonly used deposition and sputtering techniques, it has become possible to form high-quality thin films with excellent conformity on substrates such as ball lenses and high-curvature lenses, which have been considered difficult until now. 【Overview】 ○ Up to 50 φ10 inch substrates can be processed at once (25 substrates × 2 axes) 　* This varies depending on the substrate shape and conditions. ○ Equipped with a substrate rotation mechanism.

  • lens

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Vacuum film formation devices and surface analysis devices: Years of cultivated vacuum technology in this one book!

Vacuum film formation devices and surface analysis devices: Years of cultivated vacuum technology in this one book!

Years of cultivated vacuum technology! A product lineup related to vacuum equipment and scientific instruments!

This is the comprehensive catalog of Pascal Corporation, which possesses a global perspective in vacuum machinery and equipment, as well as physical and chemical instruments and devices. We constantly focus on the forefront of the times, anticipate new technologies and product needs, and continue to provide products that are beneficial to our users. We offer a lineup that includes the time-of-flight atomic scattering surface analysis device "TOFLAS-3000," which enables the polarity discrimination and structural analysis of insulator surfaces, element identification, and in-situ analysis in electric and magnetic fields—capabilities that were impossible with conventional ion scattering surface analysis devices—as well as "vacuum thin film formation devices" and "surface analysis devices." [Excerpt of Contents] ■ Vacuum devices and components ■ Surface analysis devices ■ Low-temperature related equipment ■ Agilent vacuum equipment (formerly Varian) ■ Other vacuum-related products, etc. *For more details, please refer to the PDF document or feel free to contact us.

  • Vacuum Equipment
  • Analytical Equipment and Devices
  • others

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